https://scholars.lib.ntu.edu.tw/handle/123456789/153848
Title: | Effect of Fluorine on the Radiation Hardness of Gate Oxides Prepared by Liquid Phase Deposition Following Rapid Thermal Oxidation | Authors: | 胡振國 Lu, W. S. Hwu, Jenn-Gwo |
Issue Date: | 1994 | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/153897 |
Appears in Collections: | 電機工程學系 |
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