https://scholars.lib.ntu.edu.tw/handle/123456789/155901
Title: | Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography | Authors: | Lin, C. H. Wang, L. A. |
Issue Date: | 2001 | Journal Volume: | Vacuum | Journal Issue: | 6 | Start page/Pages: | 2357-2361 | Source: | Journal of | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/148183 |
Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.