https://scholars.lib.ntu.edu.tw/handle/123456789/296936| Title: | Improvement of oxide thickness uniformity by high then low O2 pressure oxidation in rapid thermal processing | Authors: | Hong, C.-C. Chen, J.-L. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2002 | Journal Volume: | 20 | Journal Issue: | 2 | Start page/Pages: | 544-548 | Source: | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0036494479&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/296936 |
DOI: | 10.1116/1.1453455 |
| Appears in Collections: | 電機工程學系 |
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