https://scholars.lib.ntu.edu.tw/handle/123456789/296937| Title: | Improvement in ultrathin rapid thermal oxide uniformity by the control of gas flow | Authors: | Hong, C.-C. Yen, Y.-R. Su, J.-L. Hwu, J.-G. JENN-GWO HWU |
Issue Date: | 2002 | Journal Volume: | 15 | Journal Issue: | 1 | Start page/Pages: | 102-107 | Source: | IEEE Transactions on Semiconductor Manufacturing | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-0036474644&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/296937 |
DOI: | 10.1109/66.983449 |
| Appears in Collections: | 電機工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.