Improvement in ultrathin rapid thermal oxide uniformity by the control of gas flow

Journal

IEEE Transactions on Semiconductor Manufacturing

Journal Volume

15

Journal Issue

1

Pages

102-107

Date Issued

2002

Author(s)

Hong, C.-C.

Yen, Y.-R.

Su, J.-L.

Hwu, J.-G.

DOI

10.1109/66.983449

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0036474644&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/296937

Type

journal article