https://scholars.lib.ntu.edu.tw/handle/123456789/338630
Title: | Effect of strain-temperature stress on MOS structure with ultra-thin gate oxide | Authors: | Lin, C.-N. Yang, Y.-L. Chen, W.-T. Lin, S.-C. Chuang, K.-C. JENN-GWO HWU |
Issue Date: | 2008 | Journal Volume: | 85 | Journal Issue: | 9 | Start page/Pages: | 1915-1919 | Source: | Microelectronic Engineering | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-49549116191&doi=10.1016%2fj.mee.2008.06.010&partnerID=40&md5=50fed07956d52ff9930b73a4af4f8ca7 http://scholars.lib.ntu.edu.tw/handle/123456789/338630 |
DOI: | 10.1016/j.mee.2008.06.010 |
Appears in Collections: | 電機工程學系 |
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