The effect of patterned susceptor on the thickness uniformity of rapid thermal oxides

Journal

IEEE Transactions on Semiconductor Manufacturing

Journal Volume

12

Journal Issue

3

Pages

340-344

Date Issued

1999

Author(s)

Lee, K.-C.

Chang, H.-Y.

Chang, H.

Hwu, J.-G.

Wung, T.-S.

DOI

10.1109/66.778200

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0033354769&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/347705

Type

journal article