https://scholars.lib.ntu.edu.tw/handle/123456789/350117
Title: | Use of SiO 2 nanoparticles As etch mask to generate Large-area GaAs nanowires by Induced-Coupled Plasma Reactive Ion Etcher | Authors: | Wang, D.-S. Chao, J.-J. CHING-FUH LIN |
Issue Date: | 2009 | Source: | CLEO/Europe - EQEC 2009 - European Conference on Lasers and Electro-Optics and the European Quantum Electronics Conference | URI: | http://www.scopus.com/inward/record.url?eid=2-s2.0-70449589683&partnerID=MN8TOARS http://scholars.lib.ntu.edu.tw/handle/123456789/350117 |
DOI: | 10.1109/CLEOE-EQEC.2009.5196467 |
Appears in Collections: | 電機工程學系 |
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