https://scholars.lib.ntu.edu.tw/handle/123456789/372498
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Lin, T.-C. | en_US |
dc.contributor.author | Shiu, S.-C. | en_US |
dc.contributor.author | Pun, K.-L. | en_US |
dc.contributor.author | Syu, H.-J. | en_US |
dc.contributor.author | CHING-FUH LIN | en_US |
dc.date.accessioned | 2018-09-10T09:22:03Z | - |
dc.date.available | 2018-09-10T09:22:03Z | - |
dc.date.issued | 2012 | - |
dc.identifier.uri | http://www.scopus.com/inward/record.url?eid=2-s2.0-84869381652&partnerID=MN8TOARS | - |
dc.identifier.uri | http://scholars.lib.ntu.edu.tw/handle/123456789/372498 | - |
dc.description.abstract | Thin-film crystalline photovoltaic (PV) cell is a trend for future PV with its potential to achieve low cost and high efficiency. Concerning material utilization efficiency, we propose a method with a fast manufacturing method of thin crystalline Si by chemical solution. To obtain the highest efficiency of material utilization, experiments with different H2O2/HF ratio are conducted, where related mechanisms are discussed. Moreover, large-area (87.7 mm2) thin film transferred to glass is demonstrated, and with embedded nanohole structure, lowest optical reflectance of 0.26% is measured. These characteristics show that the fabricated thin film has potential for large-area crystalline thin film PV. © 2012 IEEE. | - |
dc.language | en | en |
dc.relation.ispartof | IEEE Photovoltaic Specialists Conference | en_US |
dc.source | AH-Scopus to ORCID | - |
dc.subject | crystalline materials; etching; nanostructuredmaterials; optical reflection; photovoltaic cells; silicon; thin film devices | - |
dc.subject.classification | [SDGs]SDG7 | - |
dc.subject.other | Chemical solutions; Crystalline Si; Crystalline thin films; Layer transfer; Low costs; Manufacturing methods; Material utilization; Metal-assisted chemical etching; Nanoholes; Optical reflectance; Optical reflection; Photovoltaic; Efficiency; Etching; Nanostructured materials; Photovoltaic cells; Silicon; Thin film devices; Thin films; Crystalline materials | - |
dc.title | Layer transfer of crystalline Si thin film by metal-assisted chemical etching concerning different H2O2/HF ratios | - |
dc.type | conference paper | en |
dc.identifier.doi | 10.1109/PVSC.2012.6317633 | - |
dc.relation.pages | 346-349 | - |
item.fulltext | no fulltext | - |
item.openairetype | conference paper | - |
item.openairecristype | http://purl.org/coar/resource_type/c_5794 | - |
item.grantfulltext | none | - |
item.cerifentitytype | Publications | - |
crisitem.author.dept | Photonics and Optoelectronics | - |
crisitem.author.dept | Electrical Engineering | - |
crisitem.author.dept | Electronics Engineering | - |
crisitem.author.orcid | 0000-0003-3787-2163 | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
crisitem.author.parentorg | College of Electrical Engineering and Computer Science | - |
顯示於: | 電機工程學系 |
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