Fabrication of silicon thin film by metal-assisted chemical etching
Journal
14th IEEE International Conference on Nanotechnology, IEEE-NANO 2014
Pages
799-800
Date Issued
2014
Author(s)
Abstract
We fabricate a Silicon thin film by metal-assisted chemical etching (MacEch). Generally, it is hard to make a large size silicon thin film. Here we demonstrate a low cost and simple method to lift off the silicon thin film from silicon wafer. Besides, the substrate is reusable, so we can fabricate many thin films from the same wafer. Thus, this method is competitive for commercial applications.
SDGs
Type
conference paper