https://scholars.lib.ntu.edu.tw/handle/123456789/404494| Title: | The improving Si <inf>0.5</inf> Ge <inf>0.5</inf> /Si interface quality through a low energy hydrogen plasma cleaning process and positron annihilation spectroscopy | Authors: | Hsieh, C.-F. Chen, C.-W. Chen, C.-H. Liao, M.-H. |
Issue Date: | 2014 | Publisher: | Journal Article | Journal Volume: | 4 | Journal Issue: | 1 | Start page/Pages: | 323-327 | Source: | International Journal of Automation and Smart Technology | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/404494 | DOI: | 10.5875/ausmt.v4i1.234 |
| Appears in Collections: | 電機工程學系 |
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