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  1. NTU Scholars
  2. 電機資訊學院
  3. 電機工程學系
Please use this identifier to cite or link to this item: https://scholars.lib.ntu.edu.tw/handle/123456789/404494
Title: The improving Si <inf>0.5</inf> Ge <inf>0.5</inf> /Si interface quality through a low energy hydrogen plasma cleaning process and positron annihilation spectroscopy
Authors: Hsieh, C.-F.
Chen, C.-W.
Chen, C.-H.
Liao, M.-H. 
Keywords: Defect; Low energy hydrogen plasma cleaning process; Positron annihilation spectroscopy; Sige-based devices
Issue Date: 2014
Journal Volume: 4
Journal Issue: 1
Start page/Pages: 323-327
Source: International Journal of Automation and Smart Technology 
Abstract: 
Positron Annihilation Spectra (PAS), Raman, and photoluminescence spectroscopy reveal that Sio.5Geo.5/Si interface quality can be dramatically improved through a low energy plasma cleaning process using hydrogen. In the PAS, the particularly small values of lifetime and intensity near the Sio.5Geo.5/Si interface in the treated sample indicate a 2.25 times reduction in defect concentration. Fewer defects were found in the interface, resulting in a high compressive strain of about 0.36 % in the top layer, which can be observed in Raman spectra, and a 1.39 times increase to the radiative recombination rate for the infrared emission, which can be observed in the photoluminescence spectra. Improved Sio.5Geo.5/Si interface quality leads to improved optical and electrical characteristics in SiGe-based devices in a broader range of photovoltaic applications. The PAS is also shown to be a useful metrology tool for quantifying defects in SiGe-based devices. © 2014 International Journal of Automation and Smart Technology.
URI: https://scholars.lib.ntu.edu.tw/handle/123456789/404494
DOI: 10.5875/ausmt.v4i1.234
SDG/Keyword: [SDGs]SDG7
Appears in Collections:電機工程學系

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臺大位居世界頂尖大學之列,為永久珍藏及向國際展現本校豐碩的研究成果及學術能量,圖書館整合機構典藏(NTUR)與學術庫(AH)不同功能平台,成為臺大學術典藏NTU scholars。期能整合研究能量、促進交流合作、保存學術產出、推廣研究成果。

To permanently archive and promote researcher profiles and scholarly works, Library integrates the services of “NTU Repository” with “Academic Hub” to form NTU Scholars.

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開放取用是從使用者角度提升資訊取用性的社會運動,應用在學術研究上是透過將研究著作公開供使用者自由取閱,以促進學術傳播及因應期刊訂購費用逐年攀升。同時可加速研究發展、提升研究影響力,NTU Scholars即為本校的開放取用典藏(OA Archive)平台。(點選深入了解OA)

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