|Title:||Electrically charged selectivity of poly-para-xylylene deposition||Authors:||Wu C.-Y.
|Issue Date:||2016||Journal Volume:||52||Journal Issue:||14||Start page/Pages:||3022-3025||Source:||Chemical Communications||Abstract:||
The bottom-up patterning approach provides intrinsic advantages associated with unlimited resolution but is limited by the materials available for selection. A general and simple approach towards the selective deposition of poly-para-xylylenes is introduced in this communication. The chemical vapour deposition (CVD) of poly-para-xylylenes is inhibited on the high-energy surfaces of electrically charged conducting substrates. This technology provides an approach to selectively deposit poly-para-xylylenes irrespective of the substituted functionality and to pattern these polymer thin films from the bottom up. ? The Royal Society of Chemistry 2016.
|Appears in Collections:||化學工程學系|
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