https://scholars.lib.ntu.edu.tw/handle/123456789/409847
標題: | Electrically charged selectivity of poly-para-xylylene deposition | 作者: | Wu C.-Y. Sun H.-Y. Liang W.-C. Hsu H.-L. Ho H.-Y. Chen Y.-M. Chen H.-Y. |
公開日期: | 2016 | 卷: | 52 | 期: | 14 | 起(迄)頁: | 3022-3025 | 來源出版物: | Chemical Communications | 摘要: | The bottom-up patterning approach provides intrinsic advantages associated with unlimited resolution but is limited by the materials available for selection. A general and simple approach towards the selective deposition of poly-para-xylylenes is introduced in this communication. The chemical vapour deposition (CVD) of poly-para-xylylenes is inhibited on the high-energy surfaces of electrically charged conducting substrates. This technology provides an approach to selectively deposit poly-para-xylylenes irrespective of the substituted functionality and to pattern these polymer thin films from the bottom up. ? The Royal Society of Chemistry 2016. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/409847 | ISSN: | 13597345 | DOI: | 10.1039/c5cc08059b |
顯示於: | 化學工程學系 |
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