https://scholars.lib.ntu.edu.tw/handle/123456789/409875
Title: | Substrate-selective chemical vapor deposition of reactive polymer coatings | Authors: | Chen H.-Y. Lai J.H. Jiang X. Lahann J. |
Issue Date: | 2008 | Journal Volume: | 20 | Journal Issue: | 18 | Start page/Pages: | 3474-3480 | Source: | Advanced Materials | Abstract: | A study was conducted to investigate the selective inhibition of chemical vapor deposition (CVD) polymerization by a series of metals and discovered the first metal-mediated inhibition of a functionalized poly-p-xylylene (poly(4-vinyl-p-xylylene -co-p-xylylene. Reactivity of the vinyl groups through cross-metathesis reaction was also demonstrated in the study. A series of different poly-p-xylylenes were deployed, to assess the inhibitory character of metals on the CVD polymerization of substituted (2,2)paracyclophanes. The study also demonstrated preparation of four nonreactive poly-p-xylylenes,containing a wide range of different functional groups,such as amines, alcohols,and aldehydes. It was observed that the CVD films were deposited on a library of nine different metal surfaces at the same time. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/409875 | ISSN: | 09359648 | DOI: | 10.1002/adma.200800455 |
Appears in Collections: | 化學工程學系 |
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