|Title:||Substrate-selective chemical vapor deposition of reactive polymer coatings||Authors:||Chen H.-Y.
|Issue Date:||2008||Journal Volume:||20||Journal Issue:||18||Start page/Pages:||3474-3480||Source:||Advanced Materials||Abstract:||
A study was conducted to investigate the selective inhibition of chemical vapor deposition (CVD) polymerization by a series of metals and discovered the first metal-mediated inhibition of a functionalized poly-p-xylylene (poly(4-vinyl-p-xylylene -co-p-xylylene. Reactivity of the vinyl groups through cross-metathesis reaction was also demonstrated in the study. A series of different poly-p-xylylenes were deployed, to assess the inhibitory character of metals on the CVD polymerization of substituted (2,2)paracyclophanes. The study also demonstrated preparation of four nonreactive poly-p-xylylenes,containing a wide range of different functional groups,such as amines, alcohols,and aldehydes. It was observed that the CVD films were deposited on a library of nine different metal surfaces at the same time.
|Appears in Collections:||化學工程學系|
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