https://scholars.lib.ntu.edu.tw/handle/123456789/409881
標題: | Vapor-based initiator coatings for atom transfer radical polymerization | 作者: | Jiang X. Chen H.-Y. Galvan G. Yoshida M. Lahann J. |
公開日期: | 2008 | 卷: | 18 | 期: | 1 | 起(迄)頁: | 27-35 | 來源出版物: | Advanced Functional Materials | 摘要: | A novel polymeric initiator coating for surface modification via atom transfer radical polymerization (ATRP) is reported. The synthetic approach involves the chemical vapor deposition of [2.2]paracyclophane-4-methyl 2-bromoisobutyrate and can be applied to a heterogeneous group of substrates including stainless steel, glass, silicon, poly(dimethylsiloxane), poly(methyl meth-acrylate), poly(tetrafluoroethylene), and polystyrene. Surface analysis using X-ray photoelectron spectroscopy and Fourier-transformed infrared spectroscopy confirmed the chemical structure of the reactive initiator coatings to be consistent with poly[(p-xylylene-4-methyl-2-bromoisobutyrate)-co-(p- xylylene)]. Appropriate reactivity of the bromoisobutyrate side groups was confirmed by surface initiated atom transfer radical polymerization of a oligo(ethylene glycol) methyl ether methacrylate. After solventless deposition of the CVD-based initiator coating, hydrogel films as thick as 300 nm could be conveniently prepared within a 24 h timeframe via ATRP. Moreover, the polymerization showed ATRP-specific reaction kinetics and catalyst concentration dependencies. In addition, spatially controlled deposition of the initiator coatings using vapor-assisted micro-structuring in replica structures resulted in fabrication of spatially confined hydrogel microstructures. Both protein adsorption and cell adhesion was significantly inhibited on areas that were modified by surface-initiated ATRP, when compared with unmodified PMMA substrates. The herein described initiator coatings provide a convenient access route to controlled radical polymerization on a wide range of different materials. While demonstrated only for a representative group of substrate materials including polymers, metals, and semiconductors, this method can be expected to be generically applicable - thereby eliminating the need for cumbersome modification protocols, which so far had to be established for each substrate material independently. ? 2008 WILEY-VCH Verlag GmbH & Co. KGaA. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/409881 | ISSN: | 1616301X | DOI: | 10.1002/adfm.200700789 |
顯示於: | 化學工程學系 |
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