https://scholars.lib.ntu.edu.tw/handle/123456789/424978
標題: | Combined metal-assisted chemical etching and anisotropic wet etching for anti-reflection inverted pyramidal cavities on dendrite-like textured substrates | 作者: | CHUN-HWAY HSUEH Lin Y.-K. Chen Y.-S. Hsueh C.-H. |
關鍵字: | Anisotropic wet etching;Anti-reflection;Metal-assisted chemical etching;Textured substrate | 公開日期: | 2019 | 卷: | 12 | 起(迄)頁: | 244-249 | 來源出版物: | Results in Physics | 摘要: | A simple and low-cost method using the combination of metal-assisted chemical etching (MacEtch) and anisotropic wet etching was performed to fabricate anti-reflection inverted pyramidal cavities on dendrite-like textured silicon substrates. To achieve this, a thin Ag film was deposited on an n-type (100) silicon substrate to form agglomerated Ag particles and MacEtch was performed to obtain vertically aligned etching holes on Si substrate. Subsequently, anisotropic wet etching was conducted and the etchant would penetrate the porous structure to form inverted pyramidal cavities on the dendrite-like structure. Using this two-step etching, excellent anti-reflection behavior was obtained for our textured substrates. ? 2018 The Authors |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/424978 | ISSN: | 22113797 | DOI: | 10.1016/j.rinp.2018.11.051 https://www2.scopus.com/inward/record.uri?eid=2-s2.0-85057298483&doi=10.1016%2fj.rinp.2018.11.051&partnerID=40&md5=0159eef9bf592315ec35c69bc7160016 |
顯示於: | 材料科學與工程學系 |
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1-s2.0-S2211379718330109-main.pdf | 4.24 MB | Adobe PDF | 檢視/開啟 |
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