https://scholars.lib.ntu.edu.tw/handle/123456789/424988
標題: | Viscoelastic stress relaxation in film/substrate systems - Kelvin model | 作者: | Ko S.-C. Lee S. Hsueh C.-H. CHUN-HWAY HSUEH |
公開日期: | 2003 | 卷: | 93 | 期: | 5 | 起(迄)頁: | 2453-2457 | 來源出版物: | Journal of Applied Physics | 摘要: | An analytical model was developed to study the viscoelastic stress relaxation in film/substrate systems. The viscous flow was assumed to follow the Kelvin model, and the viscoelastic solution was obtained from existing elastic solution using Laplace transform. Results indicated that the stress relaxation rate increased with decreased film-to-substrate thickness ratio. |
URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/424988 | ISSN: | 00218979 | DOI: | 10.1063/1.1541108 |
顯示於: | 材料科學與工程學系 |
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