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  4. Design of diffusion barrier and buffer layers for ?]-Zn 4 Sb 3 mid-temperature thermoelectric modules
 
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Design of diffusion barrier and buffer layers for ?]-Zn 4 Sb 3 mid-temperature thermoelectric modules

Journal
Journal of Alloys and Compounds
Journal Volume
762
Pages
631-636
Date Issued
2018
Author(s)
Chen L.-W.
Wang C.
Liao Y.-C.
Li C.-L.
Chuang T.-H.  
CHUN-HWAY HSUEH  
DOI
10.1016/j.jallcom.2018.05.251
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/425044
URL
https://www2.scopus.com/inward/record.uri?eid=2-s2.0-85047414770&doi=10.1016%2fj.jallcom.2018.05.251&partnerID=40&md5=05ea17b5369a5ac6af83f434c93772d3
Abstract
The purpose of this work was to investigate the feasibility of using sputtered Ti/W-Ti/Ti multilayer as diffusion barrier and buffer layers between £]-Zn 4 Sb 3 thermoelectric (TE) material and Ag interconnect layer for mid-temperature TE module applications. Interdiffusion at the interface was examined by both scanning electron microscope and Auger electron spectroscopy. After penetrating the Ti buffer layer, Ag, Zn and Sb were successfully blocked by the W-Ti diffusion barrier layer. We also proved that the TE sample with diffusion barrier and buffer layers showed phase stability after high temperature aging. Also, the sheet resistance decreased as the temperature increased and it indicated good electrical properties at high working temperatures. In addition, the solid-liquid interdiffusion method was used to join the TE module, and the bonding remained stable at the TE module working temperature. ? 2018 Elsevier B.V.
Subjects
Diffusion
Thermoelectric materials
Thin films
X-ray diffraction
Type
journal article

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