|Title:||A heuristic input control method for a single-product, high-volume wafer fabrication process to minimize the number of photomask changes||Authors:||CHING-CHIN CHERN
|Keywords:||Input Control Policy | Lot Size | Photolithography | Wafer Fabrication | Workload Regulation||Issue Date:||1-Jan-2004||Journal Volume:||23||Journal Issue:||1||Start page/Pages:||30||Source:||Journal of Manufacturing Systems||Abstract:||
This study proposed an input control policy, called the (k, W) rule, for a single-product, high-volume wafer fabrication process based on the special characteristics of steppers in the photolithography area, implying that the production environment possesses reentrant production flows. To add to the complexity, the setup time of each operation is time consuming. The (k, W) rule adopts the concepts of workload regulation and batch-sizing policies to release k lots of wafers for a stepper when the workload of this stepper is lower than a predefined threshold, W, for reducing setup time and raising stepper utilization. A search algorithm is proposed to determine k and W, to minimize the weighted sum of wafer waiting time, stepper idle time, and setup time. To compare the performace of the (k, W) rule with other input control policies, a simulation model is built with data collected from a DRAM wafer fabrication process in Taiwan. As observed from the simulation results, the (k, W) rule decreases setup time and increases throughput without increasing cycle time. © 2004 Society of Manufacturing Engineers.
|Appears in Collections:||工業工程學研究所|
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