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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Atomic layer chemical patterns for block copolymer assembly
Details
Atomic layer chemical patterns for block copolymer assembly
Date Issued
2018
Author(s)
Paul Franklin Nealey
Tzu-Hsuan Chang
Shisheng Xiong
Zhenqiang Ma
Michael Scott Arnold
Robert Jacobberger
TZU-HSUAN CHANG
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/429216
Type
patent
