A comprehensive model for sub-10nm electron-beam patterning through the shorttime and cold development
Journal
Nanotechnology
Journal Volume
28
Journal Issue
42
Pages
2343-2356
Date Issued
2017
Author(s)
Li-Cheng Chang
Chun Nien
Jia-Hao Ye
Cheng-Huan Chung
Vin-Cent Su
Chao-Hsin Wu
Chieh-Hsiung Kuan
Type
journal article