https://scholars.lib.ntu.edu.tw/handle/123456789/432405| Title: | AlN epitaxy on SiC by low-temperature atomic layer deposition: Via layer-by-layer, in situ atomic layer annealing | Authors: | Kao W.-C. Lee W.-H. Yi S.-H. Shen T.-H. Lin H.-C. HSIN-CHIH LIN MIIN-JANG CHEN |
Issue Date: | 2019 | Publisher: | Royal Society of Chemistry | Journal Volume: | 9 | Journal Issue: | 22 | Start page/Pages: | 12226-12231 | Source: | RSC Advances | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85064971714&doi=10.1039%2fc9ra00008a&partnerID=40&md5=da333ddda612d782d373a155172e46a1 https://scholars.lib.ntu.edu.tw/handle/123456789/432405 |
ISSN: | 20462069 | DOI: | 10.1039/c9ra00008a |
| Appears in Collections: | 材料科學與工程學系 |
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