https://scholars.lib.ntu.edu.tw/handle/123456789/432411| Title: | Effective work function modulation of the bilayer metal gate stacks by the Hf-doped thin TiN interlayer prepared by the in-situ atomic layer doping technique | Authors: | Lin Y.-S. Huang K.-W. Lin H.-C. Chen M.-J. HSIN-CHIH LIN |
Issue Date: | 2017 | Publisher: | Elsevier Ltd | Journal Volume: | 258 | Start page/Pages: | 49-53 | Source: | Solid State Communications | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85018334595&doi=10.1016%2fj.ssc.2017.04.015&partnerID=40&md5=03c6f7bff2b3cf4cc0e1417e578cf183 https://scholars.lib.ntu.edu.tw/handle/123456789/432411 |
ISSN: | 00381098 | DOI: | 10.1016/j.ssc.2017.04.015 |
| Appears in Collections: | 材料科學與工程學系 |
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