https://scholars.lib.ntu.edu.tw/handle/123456789/432415| Title: | In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics | Authors: | Tsai M.-C. Lee M.-H. Kuo C.-L. Lin H.-C. Chen M.-J. HSIN-CHIH LIN |
Issue Date: | 2016 | Publisher: | Elsevier B.V. | Journal Volume: | 387 | Start page/Pages: | 274-279 | Source: | Applied Surface Science | URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84976468119&doi=10.1016%2fj.apsusc.2016.06.071&partnerID=40&md5=b64579920d3fba023edf67e9e96ec583 https://scholars.lib.ntu.edu.tw/handle/123456789/432415 |
ISSN: | 01694332 | DOI: | 10.1016/j.apsusc.2016.06.071 |
| Appears in Collections: | 材料科學與工程學系 |
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