Characterization and properties of NiO films produced by rf magnetron sputtering with oxygen ion source assistance

Journal

Thin Solid Films

Journal Volume

572

Pages

51-55

Date Issued

2014

Author(s)

Chen S.C.

Wen C.K.

Kuo T.Y.

Peng W.C.

DOI

10.1016/j.tsf.2014.07.062

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84920867579&doi=10.1016%2fj.tsf.2014.07.062&partnerID=40&md5=9124aac3d7e44230d043898324608e04

https://scholars.lib.ntu.edu.tw/handle/123456789/432427

Publisher

Elsevier

Type

conference paper