Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil mask

Journal

AIP Advances

Journal Volume

4

Journal Issue

6

Date Issued

2014

Author(s)

Shih F.-Y.

Chen S.-Y.

Liu C.-H.

Ho P.-H.

Wu T.-S.

Chen C.-W.

Chen Y.-F.

DOI

10.1063/1.4884305

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84902438214&doi=10.1063%2f1.4884305&partnerID=40&md5=7a3995fb2ab83a0dfe0683187d2cbc9b

https://scholars.lib.ntu.edu.tw/handle/123456789/432815

Publisher

American Institute of Physics Inc.

Type

journal article