https://scholars.lib.ntu.edu.tw/handle/123456789/443305| Title: | GaAs metal-oxide-semiconductor push with molecular beam epitaxy Y<inf>2</inf>O<inf>3</inf> ??In comparison with atomic layer deposited Al<inf>2</inf>O<inf>3</inf> | Authors: | Wan, H.W. Lin, K.Y. Cheng, C.K. Su, Y.K. Lee, W.C. Hsu, C.H. Pi, T.W. Kwo, J. Hong, M. MINGHWEI HONG |
Issue Date: | 2017 | Journal Volume: | 477 | Start page/Pages: | 179-182 | Source: | Journal of Crystal Growth | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443305 | DOI: | 10.1016/j.jcrysgro.2016.11.118 |
| Appears in Collections: | 物理學系 |
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