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College of Science / 理學院
Physics / 物理學系
Ultra-high thermal stability and extremely low Dit on HfO2/p-GaAs(001) interface
Details
Ultra-high thermal stability and extremely low Dit on HfO2/p-GaAs(001) interface
Journal
Microelectronic Engineering
Journal Volume
178
Pages
154-157
Date Issued
2017
Author(s)
Wan, H.W.
Lin, Y.H.
Lin, K.Y.
Chang, T.W.
Cai, R.F.
Kwo, J.
MINGHWEI HONG
DOI
10.1016/j.mee.2017.05.037
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/443310
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-85019400299&doi=10.1016%2fj.mee.2017.05.037&partnerID=40&md5=6c4d24122dd486fcc7527f75b4675b5f
Type
journal article