https://scholars.lib.ntu.edu.tw/handle/123456789/443387| Title: | Passivation of InGaAs using in situ molecular beam epitaxy Al2 O3 / HfO2 and HfAlO/ HfO2 | Authors: | Chang, P. Lee, W.C. Huang, M.L. Lee, Y.J. Hong, M. Kwo, J. MINGHWEI HONG |
Issue Date: | 2010 | Journal Volume: | 28 | Journal Issue: | 3 | Start page/Pages: | C3A9-C3A11 | Source: | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443387 | DOI: | 10.1116/1.3273942 |
| Appears in Collections: | 物理學系 |
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