https://scholars.lib.ntu.edu.tw/handle/123456789/443390| Title: | Engineering of threshold voltages in molecular beam epitaxy-grown Al <inf>2</inf> O<inf>3</inf> / Ga<inf>2</inf> O<inf>3</inf> (Gd<inf>2</inf> O <inf>3</inf>) / In<inf>0.2</inf> Ga<inf>0.8</inf> As | Authors: | Wu, Y.D. Lin, T.D. Chiang, T.H. Chang, Y.C. Chiu, H.C. Lee, Y.J. Hong, M. Lin, C.A. Kwo, J. MINGHWEI HONG |
Issue Date: | 2010 | Journal Volume: | 28 | Journal Issue: | 3 | Start page/Pages: | C3H10-C3H13 | Source: | Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443390 | DOI: | 10.1116/1.3271141 |
| Appears in Collections: | 物理學系 |
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