Engineering of threshold voltages in molecular beam epitaxy-grown Al 2 O3 / Ga2 O3 (Gd2 O 3) / In0.2 Ga0.8 As

Journal

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Journal Volume

28

Journal Issue

3

Pages

C3H10-C3H13

Date Issued

2010

Author(s)

Wu, Y.D.

Lin, T.D.

Chiang, T.H.

Chang, Y.C.

Chiu, H.C.

Lee, Y.J.

Lin, C.A.

Kwo, J.

DOI

10.1116/1.3271141

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/443390

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84905950827&doi=10.1116%2f1.3271141&partnerID=40&md5=fd2feddd6b1b4578294622106547f0df

Type

conference paper