https://scholars.lib.ntu.edu.tw/handle/123456789/443422| Title: | Oxide scalability in Al2 O3 Ga2 O3 (Gd2 O3) In0.20 Ga0.80 AsGaAs heterostructures | Authors: | Shiu, K.H. Chiang, C.H. Lee, Y.J. Lee, W.C. Chang, P. Tung, L.T. Hong, M. Kwo, J. Tsai, W. MINGHWEI HONG |
Issue Date: | 2008 | Journal Volume: | 26 | Journal Issue: | 3 | Start page/Pages: | 1132-1135 | Source: | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443422 | DOI: | 10.1116/1.2884739 |
| Appears in Collections: | 物理學系 |
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