Oxide scalability in Al2 O3 Ga2 O3 (Gd2 O3) In0.20 Ga0.80 AsGaAs heterostructures

Journal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Journal Volume

26

Journal Issue

3

Pages

1132-1135

Date Issued

2008

Author(s)

Shiu, K.H.

Chiang, C.H.

Lee, Y.J.

Lee, W.C.

Chang, P.

Tung, L.T.

Kwo, J.

Tsai, W.

DOI

URI

URL

Type

journal article