https://scholars.lib.ntu.edu.tw/handle/123456789/443425| Title: | 1 nm equivalent oxide thickness in Ga2 O3 (Gd2 O3) In0.2 Ga0.8 As metal-oxide-semiconductor capacitors | Authors: | Shiu, K.H. Chiang, T.H. Chang, P. Tung, L.T. Hong, M. Kwo, J. Tsai, W. MINGHWEI HONG |
Issue Date: | 2008 | Journal Volume: | 92 | Journal Issue: | 17 | Source: | Applied Physics Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443425 | DOI: | 10.1063/1.2918835 |
| Appears in Collections: | 物理學系 |
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