Nanometer thick single crystal Y2 O3 films epitaxially grown on Si (111) with structures approaching perfection

Journal

Applied Physics Letters

Journal Volume

92

Journal Issue

6

Date Issued

2008

Author(s)

Nieh, C.W.

Lee, Y.J.

Lee, W.C.

Yang, Z.K.

Kortan, A.R.

Kwo, J.

Hsu, C.-H.

DOI

10.1063/1.2883939

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/443428

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-39349111101&doi=10.1063%2f1.2883939&partnerID=40&md5=0c4135eac4c1626a89fbf63e1e766534

Type

journal article