https://scholars.lib.ntu.edu.tw/handle/123456789/443437
Title: | Structural and electrical characteristics of atomic layer deposited high 庥 HfO<inf>2</inf>on GaN | Authors: | Chang, Y.C. Chiu, H.C. Lee, Y.J. Huang, M.L. Lee, K.Y. Hong, M. Chiu, Y.N. Kwo, J. Wang, Y.H. MINGHWEI HONG |
Issue Date: | 2007 | Journal Volume: | 90 | Journal Issue: | 23 | Source: | Applied Physics Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443437 | DOI: | 10.1063/1.2746057 |
Appears in Collections: | 物理學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.