Interfacial self-cleaning in atomic layer deposition of HfO2 gate dielectric on In0.15Ga0.85As

Journal

Applied Physics Letters

Journal Volume

89

Journal Issue

24

Date Issued

2006

Author(s)

Chang, C.-H.

Chiou, Y.-K.

Chang, Y.-C.

Lee, K.-Y.

Lin, T.-D.

Wu, T.-B.

Kwo, J.

DOI

10.1063/1.2405387

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/443451

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-33845892121&doi=10.1063%2f1.2405387&partnerID=40&md5=09aff2d17e467345136bbfb2f2055c95

Type

journal article