https://scholars.lib.ntu.edu.tw/handle/123456789/443451| Title: | Interfacial self-cleaning in atomic layer deposition of HfO<inf>2</inf> gate dielectric on In<inf>0.15</inf>Ga<inf>0.85</inf>As | Authors: | Chang, C.-H. Chiou, Y.-K. Chang, Y.-C. Lee, K.-Y. Lin, T.-D. Wu, T.-B. Hong, M. Kwo, J. MINGHWEI HONG |
Issue Date: | 2006 | Journal Volume: | 89 | Journal Issue: | 24 | Source: | Applied Physics Letters | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443451 | DOI: | 10.1063/1.2405387 |
| Appears in Collections: | 物理學系 |
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