https://scholars.lib.ntu.edu.tw/handle/123456789/443468| Title: | Advances in high 庥 gate dielectrics for Si and III-V semiconductors | Authors: | Kwo, J. Hong, M. Busch, B. Muller, D.A. Chabal, Y.J. Kortan, A.R. Mannaerts, J.P. Yang, B. Ye, P. Gossmann, H. Sergent, A.M. Ng, K.K. Bude, J. Schulte, W.H. Garfunkel, E. Gustafsson, T. MINGHWEI HONG |
Issue Date: | 2003 | Journal Volume: | 251 | Start page/Pages: | 645-650 | Source: | Journal of Crystal Growth | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443468 | ISBN: | 10.1016/S0022-0248(02)02192-9 |
| Appears in Collections: | 物理學系 |
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