https://scholars.lib.ntu.edu.tw/handle/123456789/443504| Title: | Epitaxial growth of Bi<inf>2</inf>Te<inf>3</inf>topological insulator thin films by temperature-gradient induced physical vapor deposition (PVD) | Authors: | Lee, H.-Y. Chen, Y.-S. Lin, Y.-C. Wu, J.-K. Lee, Y.-C. Wu, B.-K. Chern, M.-Y. Liang, C.-T. Chang, Y.H. MING-YAU CHERN |
Issue Date: | 2016 | Journal Volume: | 686 | Start page/Pages: | 989-997 | Source: | Journal of Alloys and Compounds | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/443504 | DOI: | 10.1016/j.jallcom.2016.06.266 |
| Appears in Collections: | 物理學系 |
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