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College of Engineering / 工學院
Chemical Engineering / 化學工程學系
Special issue on basics and applications of plasma technology
Details
Special issue on basics and applications of plasma technology
Journal
IEEE Transactions on Plasma Science
Journal Volume
42
Journal Issue
2
Date Issued
2014
Author(s)
Wu, J.S.
Tii, K.
Chu, J.P.
Hsu, C.-C.
JERRY CHENG-CHE HSU
DOI
10.1109/TPS.2014.2303771
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/445419
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84894540419&doi=10.1109%2fTPS.2014.2303771&partnerID=40&md5=c507b049438ca00345f470f2d88814a3
Type
other