Special issue on basics and applications of plasma technology

Journal

IEEE Transactions on Plasma Science

Journal Volume

42

Journal Issue

2

Date Issued

2014

Author(s)

Wu, J.S.

Tii, K.

Chu, J.P.

Hsu, C.-C.

JERRY CHENG-CHE HSU

DOI

10.1109/TPS.2014.2303771

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/445419

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84894540419&doi=10.1109%2fTPS.2014.2303771&partnerID=40&md5=c507b049438ca00345f470f2d88814a3

Type

other