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College of Engineering / 工學院
Chemical Engineering / 化學工程學系
Special issue on basics and applications of plasma technology
Details
Special issue on basics and applications of plasma technology
Journal
IEEE Transactions on Plasma Science
Journal Volume
41
Journal Issue
11
Pages
3190-3191
Date Issued
2013
Author(s)
Wu, J.-S.
Teii, K.
Chu, J.P.
Hsu, C.-C.
JERRY CHENG-CHE HSU
DOI
10.1109/TPS.2013.2288852
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/445420
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84888098639&doi=10.1109%2fTPS.2013.2288852&partnerID=40&md5=a5d4f5b590c2ca3103e8e859eee5b274
SDGs
[SDGs]SDG7
Type
other