Parameter analysis of chemical mechanical polishing: An investigation based on the pattern planarization model

Journal

Journal of the Electrochemical Society

Journal Volume

146

Journal Issue

9

Pages

3420-3424

Date Issued

1999

Author(s)

Lee, B.-S.

DOI

10.1149/1.1392489

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/447187

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033359774&doi=10.1149%2f1.1392489&partnerID=40&md5=6f482955bcc7dc8971fe5aa5f4c912ca

Type

journal article