An investigation about the limitation of strained-Si technology

Journal

International Symposium on VLSI Technology, Systems, and Applications

Pages

28-29

Date Issued

2009

Author(s)

Liao, M.H.

Yeh, L.

Lu, J.C.

Yu, M.H.

Wang, L.T.

Wu, J.

Jeng, P.-R.

Lee, T.-L.

Jang, S.

DOI

10.1109/VTSA.2009.5159277

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/447977

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-68349159734&doi=10.1109%2fVTSA.2009.5159277&partnerID=40&md5=873c11e6cf9b6a25c911370bd45af12f

Type

conference paper