Optimal stress design in p-MOSFET with superior performance

Journal

IEEE Transactions on Electron Devices

Journal Volume

55

Journal Issue

12

Pages

3615-3618

Date Issued

2008

Author(s)

Liao, M.H.

DOI

10.1109/TED.2008.2006921

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/447980

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-57149134092&doi=10.1109%2fTED.2008.2006921&partnerID=40&md5=73b9bf78fce0e33113e6048b1289e0c5

Type

journal article