Suspended magnetic polymer structures fabricated with exposure dose control
Journal
8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems
Pages
779-782
Date Issued
2013
Author(s)
Abstract
This work presents a fabrication process for realizing suspended magnetic polymer structures with SU-8 photoresist dispersed with Fe 3 O 4 nano-particle. By controlling the exposure doses of ultraviolet (UV) light, the floating structure is patterned at the first exposure, and then the anchor structure is patterned at the second exposure. Suspended magnetic polymer structures such as doubly-clamped beams and circular diaphragms can be fabricated successfully after releasing from one development process. In addition, the functionalities and characterizations of the realized magnetic doubly-clamped beam were demonstrated and discussed. The resonant frequencies of the structure were measured under sinusoidal magnetic fields with an amplitude of 10.37 mT. The resonant frequencies of the structures with 5 mm and 6 mm in length are 5.21 kHz and 4.18 kHz, respectively.
Type
conference paper