Novel diamond conditioner dressing characteristics of CMP polishing pad

Journal

International Journal of Machine Tools and Manufacture

Journal Volume

49

Journal Issue

9

Pages

722-729

Date Issued

2009

Author(s)

Tsai, M.-Y.

Chen, S.-T.

Liao, Y.-S.

Sung, J.

YUNN-SHIUAN LIAO

DOI

10.1016/j.ijmachtools.2009.03.001

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/448649

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-67349286962&doi=10.1016%2fj.ijmachtools.2009.03.001&partnerID=40&md5=c3cb9ae3e4e479df4ece029703046db4

Type

journal article