XRD characterization for Al- and N-doped 3C-SiC on Si (100) substrate after pulsed excimer laser anneal

Journal

Materials Science Forum

Journal Volume

717-720

Pages

497-500

Date Issued

2012

Author(s)

Lee, K.-Y.

Huang, Y.-H.

Huang, C.-F.

Chung, C.Y.

Lin, S.C.

DOI

10.4028/www.scientific.net/MSF.717-720.497

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/451524

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84861416989&doi=10.4028%2fwww.scientific.net%2fMSF.717-720.497&partnerID=40&md5=77b89d76a5903fbcf916ff7e1f62aecc

Type

conference paper