The effect of inductively-coupled-plasma reactive ion etching power on the etching rate and the surface roughness of a sapphire substrate

Journal

Journal of Nanoscience and Nanotechnology

Journal Volume

14

Journal Issue

10

Pages

8074-8078

Date Issued

2014

Author(s)

Chang, C.-M.

Shiao, M.-H.

Chiang, D.

Yang, C.-T.

Cheng, C.-T.

Hsueh, W.-J.

DOI

10.1166/jnn.2014.9383

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/451903

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84988038637&doi=10.1166%2fjnn.2014.9383&partnerID=40&md5=e74c9a538fbc9df1780c1e74568bfe17

Type

journal article