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College of Engineering / 工學院
Engineering Science and Ocean Engineering / 工程科學及海洋工程學系
Submicron patterns on sapphire substrate produced by dual layer photoresist complimentary lithography
Details
Submicron patterns on sapphire substrate produced by dual layer photoresist complimentary lithography
Journal
Applied Mechanics and Materials
Journal Volume
284-287
Pages
334-341
Date Issued
2013
Author(s)
Chang, C.-M.
Shiao, M.-H.
Chiang, D.
Yang, C.-T.
Huang, M.-J.
Cheng, C.-T.
Hsueh, W.-J.
WEN-JENG HSUEH
DOI
10.4028/www.scientific.net/AMM.284-287.334
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/451911
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-84873904125&doi=10.4028%2fwww.scientific.net%2fAMM.284-287.334&partnerID=40&md5=816a065173eb7f8c4b906ab79878f3c7
Type
conference paper