Submicron patterns on sapphire substrate produced by dual layer photoresist complimentary lithography

Journal

Applied Mechanics and Materials

Journal Volume

284-287

Pages

334-341

Date Issued

2013

Author(s)

Chang, C.-M.

Shiao, M.-H.

Chiang, D.

Yang, C.-T.

Huang, M.-J.

Cheng, C.-T.

Hsueh, W.-J.

DOI

10.4028/www.scientific.net/AMM.284-287.334

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/451911

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84873904125&doi=10.4028%2fwww.scientific.net%2fAMM.284-287.334&partnerID=40&md5=816a065173eb7f8c4b906ab79878f3c7

Type

conference paper