Characterization of Cr-Ni multilayers electroplated from a chromium(III)-nickel(II) bath using pulse current
Journal
Scripta Materialia
Journal Volume
57
Journal Issue
1
Pages
61-64
Date Issued
2007
Author(s)
Abstract
Cr-Ni multilayers with thickness modulation of several tens of nanometers were prepared by pulse-current electroplating from a Cr(III)-Ni(II) bath at 30 °C. The Cr-Ni multilayers were composed of alternate amorphous Cr-rich and nanocrystalline Ni-rich layers. This amorphous Cr-rich layer could be attributed to a reduction in the complex-formed Cr ion, which leads to the presence of C, a glass-forming element, in the Cr-rich deposit during electrodeposition. Twins were found in the nanosized Ni-rich layer, in which stacking faults were frequently observed. © 2007 Acta Materialia Inc.
Type
journal article