Effect of H-2 addition on SiCN film growth in an electron cyclotron resonance plasma chemical vapor deposition reactor
Journal
Journal of Materials Chemistry
Journal Volume
10
Journal Issue
3
Pages
783-787
Date Issued
2000
Author(s)
Wu, J. J.
Chen, K. H.
Wen, C. Y.
Chen, L. C.
Wang, J. K.
Yu, Y. C.
Wang, C. W.
Type
journal article