https://scholars.lib.ntu.edu.tw/handle/123456789/491140| Title: | Effect of H-2 addition on SiCN film growth in an electron cyclotron resonance plasma chemical vapor deposition reactor | Authors: | Wu, J. J. Chen, K. H. Wen, C. Y. Chen, L. C. Wang, J. K. Yu, Y. C. Wang, C. W. Lin, E. K. CHENG-YEN WEN |
Issue Date: | 2000 | Journal Volume: | 10 | Journal Issue: | 3 | Start page/Pages: | 783-787 | Source: | Journal of Materials Chemistry | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491140 | ISSN: | 0959-9428 | DOI: | 10.1039/a908523h |
| Appears in Collections: | 材料科學與工程學系 |
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