Fabrication of sub-60-nm contact holes in silicon dioxide layers

Journal

Microelectronic Engineering

Journal Volume

73-74

Pages

323-329

Date Issued

2004

Author(s)

Ko, F.-H.

You, H.-C.

Chu, T.-C.

Lei, T.-F.

Hsu, C.-C.

Chen, H.-L.

DOI

10.1016/S0167-9317(04)00119-4

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491364

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-17344379482&doi=10.1016%2fS0167-9317%2804%2900119-4&partnerID=40&md5=a58a3586078ee78ac4e057981570203f

Type

conference paper