https://scholars.lib.ntu.edu.tw/handle/123456789/491621| Title: | Low voltage operation of high-�e HfO<inf>2</inf>/TiO <inf>2</inf>/Al<inf>2</inf>O<inf>3</inf> single quantum well for nanoscale flash memory device applications | Authors: | Maikap, S. Wang, T.-Y. Tzeng, P.-J. Lee, H.-Y. Lin, C.-H. Wang, C.-C. Lee, L.-S. Yang, J.-R. Tsai, M.-J. JER-REN YANG |
Issue Date: | 2008 | Journal Volume: | 47 | Journal Issue: | 3 PART 1 | Start page/Pages: | 1818-1821 | Source: | Japanese Journal of Applied Physics | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491621 | DOI: | 10.1143/JJAP.47.1818 |
| Appears in Collections: | 材料科學與工程學系 |
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